In order to meet the future requirements of micro and nanotechnology, we now also offer so-called "grating structures". These are periodic nanostructures on a wafer scale.
These optical gratings are used in a wide variety of applications, such as:
If you need assistance please do not hesitate to contact us! We will be pleased to advise you by phone at + 49-(0)241/943 297-00 or by e-mail.
Grating type:
Lines and Spaces, Holes and Pillars in rectangular and hexagonal lattice
Diameter:
50.8 mm, 76.2 mm, 100 mm, 150mm, 200mm (auf Anfrage)
Substrate:
Silizium, Glas, Quarz, …
Period:
400nm to 1000nm entire area
Structure Size:
50nm – 600nm typical
etching depth:
20nm – 500nm typical